Lithography uses a kind of template, called a photomask—or just mask—for creating patterns on semiconductor wafers. The industry is always looking for methods that improve resolution and ...

Nanostencil lithography (NSL) is a shadow-mask-based nanopatterning technique that allows for the direct deposition of materials through a stencil mask with nanoscale openings. It enables the ...

This deep-UV microLED display chip integrates the ultraviolet light source with the pattern on the mask. It provides sufficient irradiation dose for photoresist exposure in a short time, creating ...

Lithography has been used to create transistors by the quintillions, making them the most widely produced manufactured product in human history. GCA’s Mann 4800 stepper was a big step forward in ...

In 2020, we developed a photomask manufacturing process for 5nm EUV lithography processes, and have been supplying masks that meet the needs of the semiconductor market.

The resist film is then exposed in an image-wise fashion via a mask (in photo- and X-ray lithography) or first-hand with acutely focused electron beams. The resist film that is exposed is subsequently ...

In a breakthrough set to revolutionize the semiconductor industry, engineers have developed the world's first-of-its-kind deep-ultraviolet (UVC) microLED display array for lithography machines.

X-ray lithography is a high-resolution patterning technique to fabricate micro and nanoelectronic devices. ... Mask Making: An X-ray mask containing the desired circuit pattern is created.

Aerial image simulations are an essential part of lithography–the light-based process by which structures are patterned in the manufacturing of modern electronics. However, these simulations are ...

SANTA CLARA, Calif. and YOKOHAMA, Japan, April 16, 2025 (GLOBE NEWSWIRE) -- To address rising global demand for its E-Beam Lithography (EBL) production systems, Multibeam has established a new ...