In the field of pan semiconductor, precision machined industrial ceramic parts have become a key factor driving industry ...

This paper reports research performed on developing and optimizing a process recipe for the plasma etching of deep high-aspect ratio features into silicon carbide (SiC) material using an ...

Microchips have quietly become one of the most strategic assets of our time. Control over them will increasingly determine ...

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Conformal atomic layer etching (cALE) of Si is realized on the basis of layer-by-layer self-limiting deposition and self-stop etching processes at low temperatures. In each cALE cycle, a conformal ...

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The time evolution of the etching cavity, concentration field and velocity field of CuCl 2 solution are studied, as well as the effects of initial concentrations and inlet velocities on the etching ...