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--Lam Research Corp. today extended its leadership in 3 D NAND flash memory etching with the introduction of Lam Cryo™ 3.0, the third generation of the company's production-proven cryogenic ...
Lam Research Corp. (Nasdaq: LRCX) today introduced Akara®, a breakthrough innovation in plasma etch and the most advanced conductor etch tool available. Akara delivers novel plasma processing ...
Several etch vendors are starting to ship next-generation selective etch tools, paving the way for new memory and logic devices. Applied Materials was the first vendor to ship a next-gen selective ...
FREMONT, Calif., March 03, 2020 (GLOBE NEWSWIRE) -- Lam Research Corp. (Nasdaq: LRCX) today announced the launch of a completely transformed plasma etch technology and system solution, designed to ...
Lam Research Corp.'s next-generation tool has the company ready for the ramp of copper and a larger wafer size or for the technology purchases that come during a downturn, whichever may be ahead in ...
Lam Research is a major vendor of semiconductor fabrication tools. The firm is the leader in dry etch, a critical step in the chipmaking process where material is selectively removed.
Lam also noted its strong position for increasing etch and deposition across various node transitions, and highlighted several new products for significantly better process control, throughput ...
Lam is a dominant supplier in the dry etch and deposition markets and counts major chipmakers, such as Samsung Electronics and Taiwan Semiconductor Manufacturing, as customers.
Lam Cryo 3.0 is optimized to address these and other etch challenges to scaling. "AI is driving exponential demand in capacity and on the performance of flash memory both at the cloud and the edge.
FREMONT, Calif., Feb. 19, 2025 /PRNewswire/ -- Lam Research Corp. (Nasdaq: LRCX) today introduced Akara ®, a breakthrough innovation in plasma etch and the most advanced conductor etch tool ...
FREMONT, Calif., March 03, 2020 (GLOBE NEWSWIRE) -- Lam Research Corp. (Nasdaq: LRCX) today announced the launch of a completely transformed plasma etch technology and system solution, designed to ...
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