To address structural inequities in research funding and participation, the department is working with the National Research ...

The Minister of Science, Technology, and Innovation, Professor Blade Nzimande, says South Africa must prioritise science, ...

High aspect ratio process (HARP) and siconi process is widely used for STI gap fill in sub-65nm CMOS; it has good gap fill performance to high aspect profile. As IC technology advances to 28 nm and ...