Inverse lithography technology (ILT)—a mathematically rigorous inverse approach that determines the mask shapes that will produce the desired on-wafer results—has been seen as a promising ...

Semiconductor Engineering sat down to discuss lithography and photomask issues with Bryan Kasprowicz, director of technology and strategy and a distinguished member of the technical staff at ...

Masks are a key piece in the EUV puzzle. At a recent workshop on next-generation lithography sponsored by International Sematech, Motorola showed a prototype mask for EUV lithography with 100-nm ...

Nanostencil lithography is a shadow-mask-based technique for direct deposition of nanostructures, offering high resolution, versatility, and simplicity for nanoelectronics, photonics, and biomedical ...

A lithography machine is crucial equipment for semiconductor manufacturing, applying short-wavelength ultraviolet light to make integrated circuit chips with various layouts. However, traditional ...

In a breakthrough set to revolutionize the semiconductor industry, engineers have developed the world's first-of-its-kind deep-ultraviolet (UVC) microLED display array for lithography machines ...

Canon introduces Nanoimprint Lithography semiconductor manufacturing equipment, posing potential competition to ASML's EUV tech at 4nm. Learn more on CAJFF stock here.

Explore the various types of lithography in nanotechnology. Learn about Photolithography, Electron Beam Lithography, Nanoimprint Lithography, and more. Discover their applications and impact on ...

President Ken MacWilliams announced the move in Yokohama today during his keynote address at Photomask Japan, the leading symposium on photomask and next-generation lithography mask technology.

DNP has successfully developed a photomask manufacturing process capable of accommodating the 3 nm lithography process that supports EUV lithography.

This approach uses thermally dewetted thin silver films as etching masks to generate subwavelength nanohole structures on the glass surfaces, characterized by its simplicity and cost-effectiveness by ...