The remote variable resistor functions as a voltage-controlled resistor whose resistance changes based on an applied voltage.

This work presents the use of ultimately thin (15 nm) L-shaped spacers to open the process window for deposition-related steps. Whereas conventional spacers prevent the correct active area ...

Dual stress liner process for high performance SOI CMOS technology at 32 nm technology node is improved through the use of dep-etch-dep, etch back, and spacer removal techniques. The stress benefit of ...